Device structures in high refractive index materials, notably semiconductors such as silicon, will form the basis for high-density integrated photonics. Nanometre-scale structuring - in conjunction with photonic crystal, photonic wire and plasmonic/metamaterial principles - will be required in order to realise the full potential for a variety of applications. ©2010 Crown.
Micro-/nano-photonic device structures applied to communications, sensing and consumer optoelectronics
VELHA, PHILIPPE;
2010-01-01
Abstract
Device structures in high refractive index materials, notably semiconductors such as silicon, will form the basis for high-density integrated photonics. Nanometre-scale structuring - in conjunction with photonic crystal, photonic wire and plasmonic/metamaterial principles - will be required in order to realise the full potential for a variety of applications. ©2010 Crown.File in questo prodotto:
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